Process for immersing a substrate in a plurality of processing b

Details Process for immersing a substrate in a plurality of processing b Process for immersing a substrate in a plurality of processing b

1995-10-04

1998-10-20

Graybill, David

Metal working

Barrier layer or semiconductor device making

134 28, 216 91, B08B 300, B44C 122, C03C 1500, C03C 2506

Patent

active

058241191

ABSTRACT:
In the substrate processing method in which substrates are immersed in processing baths holding chemicals and pure water for processing, when a substrate carrier is moved from a first processing bath to a second processing bath, the substrate carrier is moved to a second processing bath with a chemical or pure water from the first processing bath held in the substrate carrier. In subjecting substrates to chemical processing and water rinse, the substrates in the substrate carrier are carried to a next processing bath with the chemical or pure water in the first processing bath held in the substrate carrier.

REFERENCES:
patent: 3766046 (1973-10-01), Flint
patent: 4555216 (1985-11-01), Buschor
patent: 5704493 (1998-01-01), Fujikawa et al.
patent: 5730162 (1998-03-01), Shindo

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