Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1990-01-31
1991-03-19
Straub, Gary P.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423332, 423333, C01B 3332
Patent
active
050009338
ABSTRACT:
The direct hydrothermal production of high purity sodium silicate solutions having a high SiO.sub.2 : Na.sub.2 O molar ratio by reaction of a silicon dioxide source with aqueous sodium hydroxide solutions, or with aqueous sodium silicate solutions having a lower SiO.sub.2 : Na.sub.2 O molar ratio, is made possible by using a silicon dioxide source that contains a sufficient fraction of cristobalite phase, or by conditioning other crystalline forms of silicon dioxide by heating at or above 1100.degree. C., but below the melting point of silica, before the hydrothermal treatment. Preferably the sodium hydroxide solution has a concentration range of 10 to 50% by weight, and the reaction is carried out in a closed pressure reactor at temperatures of 150.degree. to 300.degree. C. and under saturated steam pressures corresponding to those temperatures.
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Hackh's Chemical Dictionary, Fourth Edition, Grant pp. 183 and 596.
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Hoff Alfred
Novotny Rudolf
Schuertz Jost
Cuomo Lori F.
Henkel Kommanditgesellschaft auf Aktien
Jaeschke Wayne C.
Straub Gary P.
Szoke Ernest G.
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