Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Reexamination Certificate
2007-07-20
2009-11-24
Lorengo, Jerry (Department: 1793)
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
C423S332000, C423S334000
Reexamination Certificate
active
07622097
ABSTRACT:
A method is provided for treating silica sand scrubs (SSS) generated and accumulated as waste in the chloride manufacturing process of titanium dioxide pigment. A hydrothermal process is used to produce sodium silicate solutions of modulus 3.0 to 3.8, and precipitated silicas. In some embodiments, the process uses two specific principal reaction stages. A sodium silicate solution having a low SiO2:Na2O molar ratio, in the range from 2.0 to 2.8, is first produced by reaction of the SSS, as a cost-effective SiO2source, with aqueous caustic soda. The conversion of this intermediate sodium silicate solution of low modulus to a high SiO2:Na2O molar ratio is made possible by using a SiO2source that is prepared as precipitated amorphous silica from the intermediate sodium silicate solution produced above.
REFERENCES:
patent: 4190632 (1980-02-01), Achenbach et al.
patent: 5000933 (1991-03-01), Novotny et al.
patent: 5215732 (1993-06-01), Hachgenei et al.
patent: 5958127 (1999-09-01), Bomal et al.
patent: 7255815 (2007-08-01), Krause et al.
patent: 2004-269311 (2004-09-01), None
El Dekki Hassan Moenes
Gopalkrishnan Chathangat Cheroolil
Trabzuni Fadi Mohammed Saeed
Chan Heng M
Kilyk & Bowersox P.L.L.C.
Lorengo Jerry
The National Titanium Bioxide Co., Ltd. (CRISTAL)
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