Chemistry of inorganic compounds – Silicon or compound thereof – Halogen containing
Patent
1994-01-28
1995-06-06
Straub, Gary P.
Chemistry of inorganic compounds
Silicon or compound thereof
Halogen containing
423347, C01B 33107
Patent
active
054220882
ABSTRACT:
An improved process for contacting hydrogen gas and tetrachlorosilane in a reactor comprising a pressurizable shell having located therein a reaction vessel forming a substantially closed inner chamber for reacting the hydrogen gas with the tetrachlorosilane. The improvement comprises feeding to an outer chamber between the pressurizable shell and the reaction vessel a gas or gaseous mixture having a chlorine to silicon molar ratio greater than about 3.5. The improvement reduces the concentration of hydrogen and tetrachlorosilane in the outer chamber that results from leakage of these gases from the substantially closed inner chamber and the detrimental reactions associated with such leakage on structural elements and performance of the reactor.
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Burgie Richard A.
Harder Patrick J.
Sawyer David H.
Boley William F.
Hemlock Semiconductor Corporation
Hendrickson Stuart L.
Straub Gary P.
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