Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal
Patent
1977-08-04
1978-06-20
Schwartz, Gerald A.
Chemistry of carbon compounds
Miscellaneous organic carbon compounds
C-metal
260566A, C07C 4714, C07C13100
Patent
active
040961877
ABSTRACT:
In the halogenation under reflux conditions of an aldehyde of the formula ##STR1## with Cl.sub.2, Br.sub.2 or I.sub.2, the aldehyde and halogen are continuously fed into a reactor at a molar ratio of halogen to aldehyde between about 0.8:1 and about 1.1:1 and water is continuously fed into the reactor at a rate of between about 1 and about 20% by weight of aldehyde. The product .alpha.-haloaldehyde is thioalkylated and then oximated to form a 2-hydrocarbylthioaldoxime of the formula ##STR2## with improved yield and quality because of the improved yield and quality of .alpha.-haloaldehyde. An exemplary process includes the chlorination of isobutyraldehyde (IBA) to form .alpha.-chloroisobutyraldehyde (CIBA), the thiomethylation of CIBA to form 2-methyl-2 methylthio-propionaldehyde (MTIBA) and the oximation of MTIBA to form 2-methylthio-propionaldehyde oxime (aldicarb oxime or ADO).
REFERENCES:
patent: 3873624 (1975-03-01), Mathew et al.
patent: 3931331 (1976-01-01), Mathew et al.
Guinot et al., Compt. rend., vol. 231 pp. 234-236 (1950).
Hagemeyer et al., "The Chemistry of Isobutyraldehyde and its Derivatives" (1953) pp. 1, 5, 10-15, 48-49, 61, 85, 87-94.
Bonfield John Henry
Murthy Andiappan Kumaresa
Pickens Donald
Allied Chemical Corporation
Doernberg Alan M.
Schwartz Gerald A.
LandOfFree
Process for halogenation of aldehydes and production of oximes t does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for halogenation of aldehydes and production of oximes t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for halogenation of aldehydes and production of oximes t will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1134325