Process for generating ultra high purity H.sub.2 or O.sub.2

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Molecular oxygen or ozone component

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423248, 423580, C01B 1300

Patent

active

039694810

ABSTRACT:
A purification system for producing extremely pure H.sub.2 from H.sub.2 gas streams containing water and small amounts of O.sub.2 comprises a single column with alternating layers of adsorbent and a catalyst for the reaction 2H.sub.2 + O.sub.2 .fwdarw. 2H.sub.2 O. The alternating layers are arranged so that the gas to be purified first meets an adsorbent layer, next a catalyst layer and finally an adsorbent layer. Two such columns can be operated alternatively, one being used to produce purified gas, while the other is backflushed with as little as 2% of the product gas of the operating column. By this technique, H.sub.2 gas can be produced having a purity as high as 99.9999% or higher. The inventive system can also be used to purify O.sub.2 gas streams containing water and small amounts of hydrogen.

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patent: 3306711 (1967-02-01), Angerhofer
patent: 3814799 (1974-06-01), Wygasch

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