Etching a substrate: processes – Forming or treating optical article
Patent
1997-11-26
2000-03-14
Breneman, Bruce
Etching a substrate: processes
Forming or treating optical article
216 26, B29D 1100
Patent
active
06036873&
ABSTRACT:
A method for precision polishing non-planar, aspherical surfaces in substrates having variations in figure which are within an order of about ten wavelengths (10 .lambda.) is performed by coating the non-planar, aspherical surface with a thin, uniform layer of material, single-point-diamond turning the layer to achieve a layer surface with an excellent surface figure, and etching the layer surface down into the substrate to completely remove the layer thereby transferring the excellent surface figure to the substrate.
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Bocchetti Mark G.
Breneman Bruce
Eastman Kodak Company
Powell Alva C
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