Process for fracturing subterranean formations

Wells – Processes – Placing fluid into the formation

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252 855R, E21B 43267

Patent

active

044638108

ABSTRACT:
The process of initiating and/or extending a fracture in a subterranean formation penetrated by a wellbore which comprises injecting a crosslinked aqueous gelled fracturing fluid through the wellbore and against the formation at a flow rate and pressure sufficient to initiate and/or extend a fracture in the formation is improved by including in the fracturing fluid at least one compatible, water-soluble, aliphatic, cationic polymer bearing a plurality of pendant quaternary ammonium groups. Said pendant quaternary ammonium groups are separated from the polymer backbone by at least two carbon atoms and have an ethylene, --CH.sub.2 CH.sub.2 --, as one of the substituents chemically bonded to the nitrogen atom. As an example, a homopolymer of

REFERENCES:
patent: 3023162 (1962-02-01), Fordyce et al.
patent: 3888312 (1975-06-01), Tiner et al.
patent: 3974077 (1976-08-01), Free
patent: 4012327 (1977-03-01), Boothe et al.
patent: 4033415 (1977-07-01), Holtmyer et al.
patent: 4078609 (1978-03-01), Pavlich
patent: 4108782 (1978-08-01), Thompson
patent: 4115339 (1978-09-01), Restaino
patent: 4158521 (1979-06-01), Anderson et al.
patent: 4237974 (1980-12-01), Scherubel
patent: 4366071 (1982-12-01), McLaughlin et al.
patent: 4366074 (1982-12-01), McLaughlin et al.

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