Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1990-09-10
1992-04-21
Weisstuch, Aaron
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
20419224, 505731, H01L 3924, C23C 1434
Patent
active
051068214
ABSTRACT:
A process for forming a thin oxide film on an underlying surface adapted for film formation thereon according to a radio frequency magnetron sputtering method using an oxide target(s). The excitation frequency is higher than 13.56 MHz and provides a lower negative target self-bias voltage permitting improved film formation.
REFERENCES:
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Homma Norio
Horishita Tadataka
Kawamoto Shinji
Kondo Hideyuki
Takahashi Hiromi
International Superconductivity Technology Center
Manzo Edward D.
Mitsubishi Metal Corporation
OKI Electric Industry Co., Ltd.
The Chugoku Electric Power Co., Inc.
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