Process for forming solid state imager with microlenses

Details Process for forming solid state imager with microlenses Process for forming solid state imager with microlenses

1995-09-26

1997-09-23

Niebling, John

Fishing, trapping, and vermin destroying

216 26, H01L 3118

Patent

active

056703848

ABSTRACT:
Microlenses are formed on a solid state imager comprising a substrate having planar radiation-sensitive regions and upstanding electrode regions by forming a conformal layer of a first, low refractive index material on the substrate, and forming a planarized layer of a second, higher refractive index material on top of the layer of first material. The portions of the second material extending down between the upstanding electrode regions act as microlenses deflecting light which would otherwise fall on the radiation-insensitive electrode regions on to the radiation-sensitive regions, thus improving the quantum efficiency of the imager.

REFERENCES:
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patent: 5384231 (1995-01-01), Johnson et al.
S. Wolf, "Silicon Processing for the VLSI Era, vol. 2: Process Integration", Lattice Pres, 1990, pp. 228-229.
Daly et al., The manufacture of microlenses by melting photoresist, Meas. Sci. Technol., 1, 759-766 (1990).
Isihara et al., A High Photosensitivity IL-CCD Image Sensor with Monolithic Lens Array, 1983 International Electron Devices Meeting, Technical Digest, pp. 497-500, 1983.
Patent Abstracts of Japan, 8(206), Abstract 59-92567, Published Sep. 20, 1984.
Sano et al., Submicron Spaced Lens Array Process Technology for a High Photosensitivity CCD Image Sensor, 1990 International Electron Devices Meeting, Technical Digest, pp. 283-286, 1990.

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