Process for forming solder resistant photoresist coatings

Details Process for forming solder resistant photoresist coatings Process for forming solder resistant photoresist coatings

1975-11-24

1977-04-19

Weiffenbach, Cameron K.

Coating processes

Electrical product produced

Welding electrode

96 362, 20415914, 20415918, 20415919, 260 775CR, 260 775BB, 427 96, 427 97, B05D 306

Patent

active

040189406

ABSTRACT:
Novel styrene-allyl alcohol copolymer based solid polyene compositions which when mixed with liquid polythiols can form solid curable polyene-polythiol systems. These solid polyenes, containing at least two reactive carbon-to-carbon unsaturated bonds, are urethane or ester derivatives of styrene-allyl alcohol copolymers. The solid polyenes are prepared by treating the hydroxyl groups of a styrene-allyl alcohol copolymer with a reactive unsaturated isocyanate, e.g., allyl isocyanate or a reactive unsaturated carboxylic acid, e.g., acrylic acid. Upon exposure to a free radical generator, e.g., actinic radiation, the solid polyene-polythiol compositions cure to solid, insoluble, chemically resistant, cross-linked polythioether products. Since the solid polyene-liquid polythiol composition can be cured in a solid state, such a curable system finds particular use in preparation of coatings, imaged surfaces such as photoresists, particularly solder-resistant photoresists, printing plates, etc.

REFERENCES:
patent: 3610811 (1971-10-01), O'Keefe
patent: 3660088 (1972-05-01), Lundsager
patent: 3832421 (1974-08-01), Morgan
patent: 3925320 (1975-12-01), Morgan

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