Fishing – trapping – and vermin destroying
Patent
1994-10-27
1996-10-15
Wilczewski, Mary
Fishing, trapping, and vermin destroying
437 19, 437908, H01L 2126, H01L 21268, H01L 21306, H01L 2142
Patent
active
055653774
ABSTRACT:
A process for forming retrograde and oscillatory profiles in crystalline and polycrystalline silicon. The process consisting of introducing an n- or p-type dopant into the silicon, or using prior doped silicon, then exposing the silicon to multiple pulses of a high-intensity laser or other appropriate energy source that melts the silicon for short time duration. Depending on the number of laser pulses directed at the silicon, retrograde profiles with peak/surface dopant concentrations which vary from 1-1e4 are produced. The laser treatment can be performed in air or in vacuum, with the silicon at room temperature or heated to a selected temperature.
REFERENCES:
patent: 4617066 (1986-10-01), Vasudev
patent: 5306651 (1994-04-01), Masumo et al.
patent: 5391903 (1995-02-01), Strater et al.
patent: 5409857 (1995-04-01), Watanabe et al.
Sigmon Thomas W.
Weiner Kurt H.
Carnahan L. E.
Dutton Brian K.
Regents of the University of California
Sartorio Henry P.
Wilczewski Mary
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