Process for forming polarization inversion layer

Details Process for forming polarization inversion layer Process for forming polarization inversion layer

1993-10-20

1995-01-17

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

20415715, H01L 2100

Patent

active

053823346

ABSTRACT:
Disclosed is a process for forming a polarization inversion layer which can form a periodic metal pattern on one major surface of a substrate and can easily form a fine periodic domain inversion structure. According to this process for forming polarization inversion layer, before or after the step of forming a three-dimensional waveguide, plural pairs of ground anodes and voltage-applying cathodes are formed at predetermined intervals, each pair sandwiching the three-dimensional waveguide along the extending direction thereof, facing each other, and set apart from each other, on one major surface of the substrate parallel to an axial direction where polarization inversion easily occurs, an electron beam is irradiated to the cathodes with the anodes grounded to thereby form a plurality of polarization inversion layers along the extending direction of the three-dimensional waveguide.

REFERENCES:
patent: 5060191 (1991-10-01), Nagasaki et al.

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