Process for forming patterned dielectric oxide films

Details Process for forming patterned dielectric oxide films Process for forming patterned dielectric oxide films

1998-04-07

1999-11-02

Talbot, Brian K.

Coating processes

Nonuniform coating

Applying superposed diverse coatings or coating a coated base

427287, 427 79, 433906, 433974, B05D 512, B05D 136

Patent

active

059766255

ABSTRACT:
A method for forming a dielectric oxide layer on selected areas of a substrate is disclosed. The dielectric oxide layer is formed on selected areas of the substrate using a sol process. The substrate has an area of a first material and an area of a second material which is different from the first. The first material is coated with a layer of a first compound. The layer of the first compound has a hydrophobic top surface. The second material is coated with a layer of a second compound. The layer of the second compound has a hydrophilic top surface. A layer of hydrous oxide is formed over the second compound by applying an aqueous sol solution on the surface of the substrate. The substrate is then heated to remove the first compound and the second compound from the surface of the substrate. Thereafter, the substrate with the layer of hydrous oxide thereon, is sintered to form the dielectric oxide layer.

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Binker, C.J. et al. "The Physics and Chemistry of Sol-Gel Processing", Sol-Gel Science, Academic Press, Inc. no month available (1990).
Angst, D.L. et al., "Moisture Absorption Characteristics of Organosiloxane Self-Assembled Monolayers", Langmuir, vol. 7, No. 10, pp. 2236-2242 mo month available (1991).

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