Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1986-10-17
1989-10-17
Silverman, Stanley
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427431, 427 44, 427 82, 427227, 427249, 427250, 4272556, B05D 306
Patent
active
048746320
ABSTRACT:
A process for forming a pattern film comprises irradating a predetermined area of a substrate with an ion beam while simultaneously having present a polymerizable or carbonizable organic compound to thereby polymerize or carbonize the compound upon the area, the compound having a vapor pressure at room temperature of 1.times.10.sup.-4 to 5.times.10.sup.-3 Torr. The process is particularly suited for correcting so-called white-spot defects in the manufacture of photomasks.
REFERENCES:
patent: 3117022 (1964-01-01), Bronson
patent: 3364087 (1968-01-01), Solomon
patent: 3516855 (1970-06-01), Goll
patent: 3547683 (1970-12-01), Williams et al.
patent: 3801366 (1974-04-01), Lemelson
patent: 3930155 (1975-12-01), Kanomata et al.
patent: 3949106 (1976-04-01), Araki et al.
patent: 4042006 (1977-08-01), Engl
patent: 4357364 (1982-11-01), Jones
patent: 4405435 (1983-09-01), Tateishi
patent: 4460436 (1984-07-01), Hiraoka
patent: 4488506 (1984-12-01), Heinecke
patent: 4609566 (1986-09-01), Hongo
patent: 4698236 (1987-10-01), Kellogg
The 45th Extended Abstracts; The Japanese Society of Applied Physics, "Carbonized Film Pattern Formed by Focused Ion Beam CVD", Oct., 1984.
Japanese Journal of Applied Physics, vol. 23, No. 5, May, 1984, pp. L293-295, article "Ion Beam Assisted Deposition of Metal Organic Films Using Focused Ion Beam" by K. Gamo et al.
Nuclear Instruments and Methods, vol. 182/183 (1981), pp. 297-302, article "Carbon Buildup by Ion-Induced Polymerization Under 100-400 keV H,He and Li Bombardment" by W. Moller et al.
Houjyo Hisao
Kaito Takashi
Nakagawa Yoshitomo
Yamamoto Masahiro
Adams Bruce L.
Seiko Instruments Inc.
Silverman Stanley
Wilks Van C.
LandOfFree
Process for forming pattern film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for forming pattern film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for forming pattern film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1742912