Process for forming metal patterns wherein metal is deposited on

Details Process for forming metal patterns wherein metal is deposited on Process for forming metal patterns wherein metal is deposited on

1983-11-30

1985-09-03

Smith, John D.

Coating processes

Electrical product produced

Condenser or capacitor

156643, 427 96, 427226, 427259, 427 91, 427 99, 430314, 430329, 430330, H01L 21285

Patent

active

045392226

ABSTRACT:
A process for forming a desired metal pattern on a substrate which comprises forming a mask of a thermally depolymerizable polymer on the substrate with a pattern of openings complementary to the desired metal pattern, blanket coating the substrate and the mask with a metal, heating to depolymerize the thermally depolymerizable polymer, and removing the thermally depolymerizable polymer and metal thereover in a mild solvent.

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patent: 4004044 (1977-01-01), Franco et al.
patent: 4181755 (1980-01-01), Liu et al.
patent: 4224361 (1980-09-01), Romankiw
patent: 4272561 (1981-06-01), Rothman et al.
patent: 4328263 (1982-05-01), Kurahashi et al.
Gregor et al., "Method for Use and Removal of Photosensitive Chemical Resist Layers" IBM TDB, vol. 7, No. 11, Apr. 1965.
IBM Technical Disclosure Bulletin, "Solventless Development of Polymeric Films" C. A. Cortellino et al., vol. 15, No. 1, Jun. 1972, p. 174.
IBM Technical Disclosure Bulletin, vol. 22, No. 2, Jul. 1979, pp. 541 and 542.
Photoresist Materials and Process, W. S. DeForest, McGraw-Hill, pp. 24, 25, 28, 29 and 60 (1975).

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