Process for forming metal deposited film containing aluminum as

Details Process for forming metal deposited film containing aluminum as Process for forming metal deposited film containing aluminum as

1991-02-19

1992-09-29

Pianalto, Bernard

Coating processes

Coating by vapor, gas, or smoke

Metal coating

20419215, 427124, 4272522, 4272557, 427299, C23C 1600

Patent

active

051513056

ABSTRACT:
A process for forming a metal film comprises the steps of arranging a substrate in a space for formation of the film, introducing an alkylaluminum hydride gas and hydrogen gas into the space and heating directly the substrate to form a metal film comprising aluminum as main component on the surface of the substrate.

REFERENCES:
patent: 4492716 (1985-01-01), Yamazaki
patent: 4825808 (1989-05-01), Takahashi et al.
patent: 4923717 (1990-05-01), Gladfelter et al.
R. A. Levy et al., "Characterization of LPCVD Aluminum for VLSI Processing", J. Electrochem. Soc., 131, 2175-82 (1984).

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