Coating processes – Coating by vapor – gas – or smoke – Metal coating
Patent
1992-02-28
1992-10-13
Pianalto, Bernard
Coating processes
Coating by vapor, gas, or smoke
Metal coating
427252, 4272552, 427264, 427265, 427270, 427271, 437 51, 437228, 437235, 437243, 437245, C23C 1600
Patent
active
051549492
ABSTRACT:
A process for forming an additive-containing Al film of good quality according to the CVD method utilizing an alkyl aluminum hydride, a gas containing an additive and hydrogen, which is an excellent deposited film formation process also capable of selective deposition of additive-containing Al.
REFERENCES:
R. A. Levy et al., "Characterization of LPCVD Aluminum for VLSI Processing", Journal of the Electrochemical Society, vol. 131, No. 9, pp. 2175-2182, Sep. 1984.
R. Bhat et al., "The Growth and Characterization of AlGaAs Using Dimethyl Aluminum Hydride", Journal of Crystal Growth, vol. 77, pp. 7-10 (1986).
M. Hanabusa et al., "Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride", Japanese Journal of Applied Physics, vol. 27, No. 8, L1392-L1394, Aug. 1988.
A. Sekiguchi et al., "Gas-Temperature-Controlled (GTC) CVD of Aluminum and Aluminum-Silicon Alloy Film for VLSI Processing", Japanese Journal of Applied Physics, vol. 27, No. 11, pp. L2134-L2136, Nov. 1988.
Ichikawa Takeshi
Ikeda Osamu
Matsumoto Shigeyuki
Ohmi Kazuaki
Shindo Hitoshi
Canon Kabushiki Kaisha
Pianalto Bernard
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