Process for forming metal deposited film containing aluminum as

Details Process for forming metal deposited film containing aluminum as Process for forming metal deposited film containing aluminum as

1992-07-17

1994-07-19

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

118719, 118723R, 118723E, C23C 1434, C23C 1600

Patent

active

053306333

ABSTRACT:
A process for forming a metal film comprises the steps of arranging a substrate in a space for formation of the film, introducing an alkylaluminum hydride gas and hydrogen gas into the space and heating directly the substrate to form a metal film comprising aluminum as main component on the surface of the substrate.

REFERENCES:
patent: 4693777 (1987-09-01), Hazano et al.
patent: 4715921 (1987-12-01), Maher et al.
patent: 4891488 (1990-01-01), Davis et al.
patent: 4951601 (1990-08-01), Maydan et al.

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