Process for forming insulating film used in thin film electrolum

Details Process for forming insulating film used in thin film electrolum Process for forming insulating film used in thin film electrolum

1988-03-30

1990-01-23

Silverman, Stanley

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 77, 427 78, 427 99, B05D 306

Patent

active

048957348

ABSTRACT:
An insulating film formed by a plasma CVD method at the substrate temperature of 350.degree. to 550.degree. C.l is good in electric properties and heat resistance without causing whitening phenomenon is suitable for use in a thin-film electroluminescent device.

REFERENCES:
patent: 3600218 (1971-08-01), Pennebaker
patent: 4310614 (1982-01-01), Connell et al.
patent: 4330569 (1982-05-01), Gulett et al.
patent: 4436770 (1984-03-01), Nishizawa et al.
patent: 4532150 (1985-07-01), Endo et al.
patent: 4657775 (1987-04-01), Shioiri et al.
patent: 4686110 (1987-08-01), Endo et al.
patent: 4704299 (1987-11-01), Wielonski et al.

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