Process for forming deposited film

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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B05D 306

Patent

active

047660074

ABSTRACT:
A process for forming deposited film of an element or a compound on a substrate provided in a deposition chamber while applying an energy selected from the group consisting of thermal energy, electrodischarging energy and optical energy, characterized by cooling the electrode or both electrode and inner wall of a deposition chamber, which are opposed to the substrate.

REFERENCES:
patent: 4507375 (1985-03-01), Hirai

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