Process for forming deposited film

Details Process for forming deposited film Process for forming deposited film

1986-02-20

1989-04-04

Beck, Shrive

Coating processes

Electrical product produced

Welding electrode

427 86, 430 86, 430128, 430130, 430134, 430136, 430225, B05D 306

Patent

active

048185639

ABSTRACT:
A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing germanium and a halogen and an active species (B) formed from a chemical substance for film formation which is reactive with said active species (A) separately from each other, then providing them with heat energy and thereby allowing both the species to react with each other thereby to form a deposited film on the substrate.

REFERENCES:
patent: 3473978 (1969-10-01), Jackson et al.
patent: 3825439 (1974-07-01), Tick
patent: 3916034 (1975-10-01), Tsuchimoto
patent: 4077818 (1978-03-01), Chu
patent: 4084024 (1978-04-01), Schumacher
patent: 4217374 (1980-08-01), Ovshinsky
patent: 4220488 (1980-09-01), Duchemin et al.
patent: 4282267 (1981-08-01), Kuyel
patent: 4402762 (1983-09-01), John et al.
patent: 4410559 (1983-10-01), Hamakawa et al.
patent: 4419381 (1983-12-01), Yamazaki
patent: 4430185 (1984-02-01), Shimomoto et al.
patent: 4434188 (1984-02-01), Kamo et al.
patent: 4439463 (1984-03-01), Miller
patent: 4448801 (1984-05-01), Fukuda
patent: 4450185 (1984-05-01), Shimizu et al.
patent: 4461783 (1984-07-01), Yamazaki
patent: 4466992 (1984-08-01), Dreiling
patent: 4468413 (1984-08-01), Bachman
patent: 4468443 (1984-08-01), Shimizu et al.
patent: 4471042 (1984-09-01), Komatsu
patent: 4485125 (1984-11-01), Izu et al.
patent: 4504518 (1985-03-01), Ovshinsky et al.
patent: 4514437 (1985-04-01), Nath
patent: 4517223 (1985-05-01), Oushinsky
patent: 4521447 (1985-06-01), Ovshinsky et al.
patent: 4522663 (1985-06-01), Ovshinsky et al.
patent: 4526805 (1985-07-01), Yoshizawa
patent: 4532199 (1985-07-01), Ueno
patent: 4543267 (1985-09-01), Yamazaki
patent: 4544423 (1985-10-01), Tsuge et al.
patent: 4546008 (1985-10-01), Saitoh
patent: 4554180 (1985-11-01), Hirooka
patent: 4564533 (1986-01-01), Yamazaki
patent: 4564997 (1986-01-01), Matsuo et al.
patent: 4567127 (1986-01-01), Saitoh et al.
patent: 4569697 (1986-02-01), Tsu et al.
patent: 4582560 (1986-04-01), Sanjurjo
patent: 4615905 (1986-10-01), Ovshinsky
patent: 4657777 (1987-04-01), Hirooka
patent: 4664937 (1987-05-01), Ovshinsky et al.
patent: 4689093 (1987-08-01), Ishihara et al.
Brodsky, et al, 22 IBM Technical Disclosure Bulletin 3391 (Jan. 1980).
Janai, et al., 52 J. Appl. Phys. 3622 (May 1981).

Affiliated with

Also associated with

Rating

Process for forming deposited film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for forming deposited film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for forming deposited film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-179245