Process for forming an organic thin film

Details Process for forming an organic thin film Process for forming an organic thin film

1984-10-12

1986-08-05

Page, Thurman K.

Coating processes

Electrical product produced

Welding electrode

427255, 4272556, 427294, 427314, B05D 306

Patent

active

046042946

ABSTRACT:
An organic thin film consisting essentially of an organic compound is formed on a substrate surface by vacuum vapor deposition by exposing the organic compound as a vapor source to a laser beam having an energy level corresponding to that of the chemical bond of the organic compound, thereby sputtering the organic compound onto a substrate surface in vacuum and forming the organic thin film thereon. When a light or radiation-sensitive organic compound is used as the vapor source, a light or radiation-sensitive resist film is formed. The thin film thus formed retains the original chemical structure of the vapor source, and has a good flatness. Resolvability of resist film is improved owing to the absence of pin holes and particulate matters. A resist film having a higher sensitivity and a better contrast is formed by heating the substrate during the vapor deposition.

REFERENCES:
patent: 3987215 (1976-10-01), Cortellino
patent: 4390601 (1983-06-01), Ono et al.
Chemical Abstracts, 94(14): 104,985g (1981).

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