Coating processes – Coating by vapor – gas – or smoke
Patent
1997-03-31
1999-09-28
King, Roy V.
Coating processes
Coating by vapor, gas, or smoke
4272557, 427314, 438585, 438592, 20419215, C23C 1600, H01L 21285
Patent
active
059585080
ABSTRACT:
A metal-semiconductor layer (26) is formed over an insulating layer (20) such that the metal-semiconductor layer (26) is graded to have varying amounts of the semiconductor and metal throughout the layer. In one embodiment, the metal-semiconductor layer (26) has relatively higher silicon content near the layer's lower and upper surfaces. At the midpoint, the layer is close to stoichiometric tungsten silicide. In another embodiment, a metal-semiconductor-nitrogen layer is formed having nitrogen nearer the lower surface and essentially no nitrogen near the upper surface. The layer (26) can be formed using chemical vapor deposition or sputtering.
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Adetutu Olubunmi Olufemi
Denning Dean J.
Hayden James D.
Sitaram Arkalgud R.
Subramanian Chitra K.
King Roy V.
Meyer George R.
Motorlola, Inc.
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