Process for forming a reduced electrochromic layer in contact wi

Details Process for forming a reduced electrochromic layer in contact wi Process for forming a reduced electrochromic layer in contact wi

1989-01-17

1991-05-28

Morgenstern, Norman

Coating processes

Electrical product produced

Metallic compound coating

4271265, 427162, 4272552, 4273835, 4274193, 427166, 427167, 350357, G02F 101, B05D 512

Patent

active

050194208

ABSTRACT:
A process, based on sputtering from metal sources, is disclosed for forming a stable, reduced electrochromic layer in contact with an ionically conducting oxide. A deposited electrochromic layer is reduced by sputtering onto it an alloy or composite metallic thin film capable of injecting insertion atoms into the electrochromic layer. The metallic thin film, now partially depleted in insertion atoms, is converted into an electronically insulating but ionically conducting oxide layer in an oxidizing atmosphere. The resultant two-layer structure, consisting of the reduced electrochromic layer capped by the insulating oxide, may be used as on component in an all solid-state electrochromic device.

REFERENCES:
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patent: 4253742 (1981-03-01), Morita
patent: 4282272 (1981-08-01), Matsuhiro et al.
patent: 4308658 (1982-01-01), Yano et al.
patent: 4347265 (1982-08-01), Washo
patent: 4474828 (1984-10-01), Young et al.
Yoshimura et al., Jap. J. of Appl. Phys., vol. 22, No. 1, Jan. 1983, pp. 152-156.
Oi, Appl. Phys. Latt., 37(2), 15 Jul. 1980, pp. 244-245.
Haas et al., Proc. SPIE, vol. 823, p. 81, 1987.

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