Process for forming a photosensitive material and an exposure ap

Details Process for forming a photosensitive material and an exposure ap Process for forming a photosensitive material and an exposure ap

1994-06-21

1998-04-21

Sikes, William L.

Liquid crystal cells, elements and systems

Liquid crystal system

Liquid crystal for recording or imaging on photosensitive...

430269, G02F 113, G03C 1492

Patent

active

057423628

ABSTRACT:
Mask patterns and their exposure times are stored in a memory within a controller. The controller transfers the mask pattern to a memory in the liquid crystal controller. The mask pattern stored in the memory is displayed on the matrix liquid crystal display element. The controller transfers the next mask pattern to memory after the elapse of exposure time. By this exposure apparatus, a plurality of mask patterns is exposed on a photosensitive material. The exposure time of each portion of the photosensitive material is adjusted in three or more grades by exposing a plurality of mask patterns sequentially. If the photosensitive material is positive, the film thickness becomes low in a portion which has a long exposure time and high in a portion which has a short exposure time. A combination of a plurality of mask patterns enables the section of the photosensitive material to be formed into a desired shape.

REFERENCES:
patent: 4675702 (1987-06-01), Gerber
patent: 5045419 (1991-09-01), Okumura
patent: 5082755 (1992-01-01), Liu
patent: 5344748 (1994-09-01), Feely
Takamizawa et al., "Multilayer Ceramic Substrate with UV Curable Dielectric Paste for Multi-Chip Package", Proceedings of the 1985 Symposium on Microelectronics, Nov. 1995, pp. 373-379.
Microelectronics Packaging Handbook, Edited by Rao R. Tummala et al., Van Nostrand Reinhold, 1989, pp. 706-708.
IBM Technical Disclosure Bulletin, Aug. 1992.

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