Process for forming a phosphor

Details Process for forming a phosphor Process for forming a phosphor

1994-10-17

1995-10-24

Utech, Benjamin L.

Fishing, trapping, and vermin destroying

437 4, 427 68, 427 70, 4271262, 427257, 427267, 427294, 4273761, H01L 3118, B05D 512

Patent

active

054609801

ABSTRACT:
The growth of a phosphor layer deposited on a patterned substrate containing a multiplicity of recessed ridges of triangular cross section can be controlled by tailoring the geometry of the recessed ridge structures. During the deposition process, little or no phosphor deposition occurs on the recessed ridge structures, and cracks are formed which separate the otherwise uniformly growing phosphor which is present in other regions of the patterned substrate where more substantial phosphor deposition occurs.

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"Enhanced Structure in CsI Layer by Substrate Patterning", Jing et al., IEEE Trans. Nucl. Sci., vol. 39, No. 5 (Oct. 1992).

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