Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1995-05-23
1996-09-10
Huff, Mark F.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
4302701, 430313, 430176, 430192, 430916, 430925, 430927, G03C 100, G03C 172, G03F 7075
Patent
active
055544657
ABSTRACT:
The present invention provides a composition having sensitivity to light or radiation. The composition comprises a polymer having a siloxane-bond structure which undergoes polymerization reaction when irridiated with light or radiation, and a sensitizing agent. The present invention also provides a process for forming a pattern, preparing a photomask and a semiconductor device by using the composition of the present invention.
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Huff Mark F.
Matsushita Electronics Corporation
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