Process for forming a deposited film using a light transmissive

Details Process for forming a deposited film using a light transmissive Process for forming a deposited film using a light transmissive

1995-04-06

1996-12-17

King, Roy V.

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427574, 427582, 427583, 427584, 118722, 118723MP, B05D 306, H05H 100

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active

055851487

ABSTRACT:
A process for forming a deposited film on a substrate including generating a plasma in a plasma generating chamber via a light transmissive perforated diffusion plate which is located adjacent to a reaction chamber containing the substrate. The plasma thereby excites a gas, which is introduced into the reaction chamber through the light-transmissive perforated diffusion plate. A gaseous starting material for forming the deposited film is introduced into the reaction chamber and reacts with the excited gas. A deposited film is formed on the substrate while irradiating the substrate with a light scattered by the light-transmissive perforated diffusion plate.

REFERENCES:
patent: 4715318 (1987-12-01), Kameyawa et al.
patent: 4989544 (1991-02-01), Yoshikawa

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