Process for forming a deposited film by reacting between a gaseo

Details Process for forming a deposited film by reacting between a gaseo Process for forming a deposited film by reacting between a gaseo

1994-09-21

1997-04-29

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Photoinitiated chemical vapor deposition

427582, 427586, 4272551, 4272552, 117 89, 117 92, 117 93, C23C 1648, C23C 800, C23C 1600

Patent

active

056247206

ABSTRACT:
A process for forming a deposition film comprises introducing a gaseous starting material for forming a deposition film and a gaseous oxidizing agent having an oxidation action on the gaseous starting material separately into a reaction space to chemically contact these two, thereby generating a plurality of precursors including precursor in an excited state, and utilizing at least one of the generated precursors as a supply source for film-constituting members, thereby forming a deposition film on a substrate provided in a film-forming space, the deposition film being formed while supplying a bias energy to the substrate and changing the intensity of the bias energy.

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