Process for forming a-axis-on-c-axis double-layer oxide supercon

Superconductor technology: apparatus – material – process – Processes of producing or treating high temperature... – Coating

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505475, 505234, 505500, 505742, 204 9224, 427 62, B05D 306, B05D 512

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058859390

ABSTRACT:
A process for forming a laminate of 123-type copper oxide superconductor thin films having dissimilar crystal axis orientations, a laminate of 123-type thin copper oxide superconductor layers exhibiting excellent superconducting property, and wiring for Josephson junction. A c-axis oriented single crystalline thin film of an oxide superconductor having a Y:Ba:Cu atomic ratio of substantially 1:2:3 and a lattice constant of 11.60 angstroms.ltoreq.c.ltoreq.11.70 angstroms at a temperature of 20.degree. C. under an oxygen partial pressure of 160 Torr is formed on a single crystalline substrate, and an a-axis oriented single crystalline thin film of said oxide superconductor is formed on the above laminated film relying upon a sputter deposition method.

REFERENCES:
patent: 5428005 (1995-06-01), Matsuura et al.
Hsieh et al, Thin Solid Films, 216 (1992) pp. 28-32.
Bourdillon et al, "High Temperature Superconductors, Processing and Science", Academic Press, Inc. (San Diego, CA) 1994, pp. 42-44.
Singh et al, J. Appl. Phys. 67(8), Apr. 1990, pp. 3785-3790.
Cheung et al, Appl. Phys. Lett. 60(25) Jun. 1992 pp. 3180-3182.

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