Process for fluorimetric monitoring of functional coatings and c

Details Process for fluorimetric monitoring of functional coatings and c Process for fluorimetric monitoring of functional coatings and c

1991-06-05

1993-12-14

McCamish, Marion E.

Stock material or miscellaneous articles

Composite

Of silicon containing

523124, 523125, 528 43, 528 68, 528 69, 526284, 25230119, 2523016R, 2504611, 2504621, 2504842, 427515, 427520, 428913, B32B 904

Patent

active

052701166

ABSTRACT:
A method for monitoring the coating weight, uniformity, defects or markings present in a coating of a composition applied to a substrate comprises the steps:

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G. W. Jones and W. R. Pratt, "Method to Detect Residual Photoresist", IBM Technical Disclosure Bulletin, vol. 27, No. 4A, Sep. 1984, p. 2202.
United States Ser. No. 07/359,108, filed May 31, 1989.

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