Radiation imagery chemistry: process – composition – or product th – Dye image from radiation sensitive dye or dye former by dry... – Fixing or stabilizing image
Patent
1995-04-28
1996-12-10
McPherson, John A.
Radiation imagery chemistry: process, composition, or product th
Dye image from radiation sensitive dye or dye former by dry...
Fixing or stabilizing image
430332, 430335, 430336, 430338, G03C 173, G03C 500
Patent
active
055829562
ABSTRACT:
A process for producing and fixing an image uses an imaging medium comprising an acid-generating layer or phase comprising a mixture of a superacid precursor, a sensitizer and a secondary acid generator, and a color-change layer comprising an image dye. The sensitizer can absorb radiation of a sensitizer wavelength which does not, in the absence of the sensitizer, cause decomposition of the superacid precursor to form the corresponding superacid. The secondary acid generator is capable of acid-catalyzed thermal decomposition by the first acid to form a secondary acid, and the image dye undergoes a color change upon contact with the secondary acid. The medium is imagewise exposed to radiation of the sensitizer wavelength, thereby causing the sensitizer, in exposed areas, to decompose superacid precursor with formation of the fist acid. The medium is then heated to cause, in the exposed areas, acid-catalyzed thermal decomposition of the secondary acid generator and formation of the secondary acid. The components of the acid-generating and color-change layers or phases are mixed so that in exposed areas, the secondary acid causes the image dye to change color. At least the non-exposed areas, there is reacted with the superacid precursor a reactive material which irreversibly destroys the superacid precursor, thus fixing the image.
REFERENCES:
patent: 3617270 (1971-11-01), Kampfer
patent: 3623866 (1971-11-01), Averbach
patent: 3915706 (1975-10-01), Limburg et al.
patent: 3932514 (1976-01-01), Thelen et al.
patent: 4092146 (1978-05-01), Fischer et al.
patent: 4159387 (1979-06-01), Bellus
patent: 4251619 (1981-02-01), Kurita
patent: 4306014 (1981-12-01), Kunikane et al.
patent: 4345017 (1982-08-01), Cournoyer et al.
patent: 4508811 (1985-04-01), Gravesteijn et al.
patent: 4602263 (1986-07-01), Borrer et al.
patent: 4659649 (1987-04-01), Dickinson et al.
patent: 4701402 (1987-10-01), Patel et al.
patent: 4720449 (1988-01-01), Borrer et al.
patent: 4826976 (1989-05-01), Borrer et al.
patent: 4857437 (1989-08-01), Banks et al.
patent: 4916046 (1990-04-01), Doessel
patent: 4992571 (1991-02-01), Fukuyama et al.
patent: 5037575 (1991-08-01), Miura et al.
patent: 5055376 (1991-10-01), Saeva
patent: 5084371 (1992-01-01), Schwalm et al.
patent: 5102771 (1992-04-01), Vogel et al.
patent: 5141969 (1992-08-01), Saeva et al.
patent: 5219703 (1993-06-01), Bugner et al.
patent: 5227499 (1993-07-01), Lee et al.
patent: 5278031 (1994-01-01), Boggs et al.
patent: 5286612 (1994-02-01), Telfer
patent: 5334489 (1994-08-01), Grasshoff et al.
patent: 5354873 (1994-10-01), Allen et al.
patent: 5395736 (1995-03-01), Grasshoff et al.
patent: 5405976 (1995-04-01), Telfer et al.
Beringer, F. M. et al., J. Am. Chem. Soc., 60, 141 (1956).
Berry et al., Chemically Amplified Resists for I-line and G-line Applications, SPIE 1262, 575 (1990).
Bi, Y. et al., J. Photochem. Photobiol. A: Chem, 74, 221 (1993).
Bou et al., Tetrahedron Letters, 23(3), 361 (1982).
Cohen S. and Cohen, S. G., J. Am. Chem. Soc., 88, 1533 (1966).
Crivello et al., J. Polym. Sci., Polym. Chem. Ed., 16, 2441 (1978).
Crivello et al., J. Polym. Sci., Polym. Chem. Ed., 19,539 (1981).
Crivello et al., J. Polym. Sci., Chem. Ed., 21, 1097 (1983).
Crivello et al., J. Polym. Sci., Polym Chem. Ed., 21, 97 (1983).
Dehmlow et al., Chem. Ber. 113(1), 1-8 (1979).
Dehmlow et al., Chem. Ber. 121(3), 569-71 (1988).
Fouassier et al., J. Imag. Sci. Tech., 37(2), 208 (1993).
Hammerich and Parker, Acta Chemica Scandinavica, B 36, 63-64 (1982).
Islam, N. et al., Tetrahedron 43, 959-970 (1987).
Ito et al., Polymer Sci. Eng., 23(18), 1012 (1983).
Krohke, Synthesis, 1976, 1.
Mitchell, R. D. et al., J. Imag. Sci., 30(5), 215 (1986).
Lockhart, T. P., J. Am. Chem. Soc., 105(7), 1940 (1983).
Ohe, Y. et al., J. Imag. Sci. Tech., 37(3), 250 (1993).
Pappas, S. P. et al., Progress in Organic coatings, 13, 35 (1964).
Pericas et al., Tetrahedron Letters, (1977), 4437-38.
Ptitsyna et al., Zh. Organ Khim., 6(7), 1353 (1970) (English translation only).
Reichmanis et al., Chemical Amplification Mechanism for Microlithography, Chem. Mater., 3(3), 394 (1991).
Wallraff, G. M. et al., J. Imag. Sci. Tech., 36(5), 468 (1992).
Weiss, J. Am. Chem. Soc., 74, 200 (1952).
Baker Rita S. S.
Ehret Anne
Marshall John L.
Takiff Larry C.
Telfer Stephen J.
Cole David J.
McPherson John A.
Polaroid Corporation
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