Process for film formation

Details Process for film formation Process for film formation

1996-07-29

1997-10-14

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427264, 427269, 427270, 427271, 427287, 4273835, 427404, 4274198, 427596, B05D 300

Patent

active

056770146

ABSTRACT:
A process for forming a film on a ceramic substrate or on a fired film formed thereon includes coating, on a ceramic substrate or on a fired film formed thereon, a material which becomes a metallic film or a ceramic film upon firing, to form an as-coated film, irradiating the as-coated film with an energy beam which does not damage the ceramic substrate or the fired film formed thereon to such an extent that it becomes useless and which can decompose and remove the as-coated film, to trim the unrequired portion(s) of the as-coated film, and firing the trimmed as-coated film to form a desired film. The film can be formed on a ceramic substrate or on a fired film formed thereon while the damage to the substrate or the fired film is minimized.

REFERENCES:
patent: 4814259 (1989-03-01), Newman et al.

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