Process for fabrication of high resolution flat panel plasma dis

Details Process for fabrication of high resolution flat panel plasma dis Process for fabrication of high resolution flat panel plasma dis

1989-07-10

1990-10-16

Ramsey, Kenneth J.

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

65 31, 156657, H01J 920, H01J 6162

Patent

active

049631144

ABSTRACT:
A method of fabricating a display panel on a substrate material of soda-lime float glass. A dielectric layer composed of a mixture of lead, silicon and aluminum is deposited on the substrate to a thickness of from 25 to 150 microns. A masking pattern is defined on the surface of the dielectric layer where plasma display cavities are to be formed. Openings are etched in the dielectric layer with fluoboric acid to geometries no larger than approximately 0.15 mm wide by 0.15 mm thick at regions defined by the masking pattern, the openings extending to the major surface of the substrate and forming a plasma display cavity. A cover is provided over the cavity to form an enclosed envelope containing a noble gas. A phosphor is provided in the plasma display cavity together with electrodes adjacent to the cavity for ionizing the gas and exciting the phosphor.

REFERENCES:
patent: 1861577 (1932-06-01), Mattman
patent: 3755027 (1973-08-01), Gilsing
patent: 3896327 (1975-07-01), Schermerhorn
patent: 3916393 (1975-10-01), Criscimagna et al.
patent: 3925703 (1975-12-01), Schermerhorn
patent: 4011071 (1977-03-01), Siegmand
patent: 4320418 (1982-03-01), Pavliscak
patent: 4439270 (1984-03-01), Powell et al.
Kern Thin/film Processes Academic Press, New York, NY 1978 pp. 435-436.
Hackh's Chemical Dictionary McGraw Hill, New York, NY 1969 p. 298 "Glass".

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