Liquid crystal cells – elements and systems – Particular excitation of liquid crystal – Electrical excitation of liquid crystal
Reexamination Certificate
2006-07-25
2006-07-25
Nguyen, Dung (Department: 2871)
Liquid crystal cells, elements and systems
Particular excitation of liquid crystal
Electrical excitation of liquid crystal
C349S038000, C349S145000
Reexamination Certificate
active
07081930
ABSTRACT:
Pixels of a liquid crystal display are laid on a delta pattern, and short-circuit is liable to take place between a source layer and a drain layer and/or between a gate layer and a storage electrode layer, wherein a contact slit is formed in a gate insulating layer intervening between the gate/storage electrode layers and the source/drain layers in such a manner as to break a piece of residual amorphous silicon and make a piece of residual metal exposed thereto, and the piece of residual metal is broken during a patterning step for the source/drain layers.
REFERENCES:
patent: 5872021 (1999-02-01), Matsumoto
patent: 5942310 (1999-08-01), Moon
patent: 5963279 (1999-10-01), Taguchi
patent: 6025892 (2000-02-01), Kawai et al.
patent: 6620655 (2003-09-01), Ha et al.
patent: 6781644 (2004-08-01), Taguchi
patent: 5-265039 (1993-10-01), None
patent: 7-199223 (1995-08-01), None
patent: 9-230376 (1997-09-01), None
patent: 9-258244 (1997-10-01), None
patent: 10-19573 (1998-01-01), None
patent: 2000-349291 (2000-12-01), None
patent: WO 96/26463 (1996-08-01), None
Foley & Lardner LLP
NEC LCD Technologies Ltd.
Nguyen Dung
LandOfFree
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