Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – Including change in a growth-influencing parameter
Patent
1997-03-06
1998-07-28
Kunemund, Robert
Single-crystal, oriented-crystal, and epitaxy growth processes;
Forming from vapor or gaseous state
Including change in a growth-influencing parameter
117106, 117108, 117936, 117940, C30B 2304
Patent
active
057857563
ABSTRACT:
A novel molecular beam epitaxy deposition process for precisely growing structurally robust films and coatings containing germanium and various fluoride compounds for use as an optical filter. The process comprises depositing two (2) materials having different indices of refraction via molecular beam epitaxy at a temperature significantly lower than the optimal growth temperature. At such lower temperature, layers of the respective compounds are grown, via molecular beam epitaxy, such that the layers contain large concentrations of dislocations. Once the film or coating has been grown to the desired thickness, the material deposited is allowed to cool to room temperature and may then be used in a wide range of applications.
REFERENCES:
patent: 4786616 (1988-11-01), Awal et al.
patent: 4870032 (1989-09-01), Johnston, Jr. et al.
patent: 5100832 (1992-03-01), Kitagawa et al.
patent: 5141894 (1992-08-01), Bisaro et al.
patent: 5164359 (1992-11-01), Calviello et al.
patent: 5173443 (1992-12-01), Biricik et al.
patent: 5229332 (1993-07-01), Cho
patent: 5356831 (1994-10-01), Calviello et al.
patent: 5387459 (1995-02-01), Hung
patent: 5458084 (1995-10-01), Thorne et al.
Schowalter, et al, "Molecular Beam Epitaxy Growth and Applications of epitaxial Fluoride Films", J. Vac. Sci. Technol. A 4(3) pp. 1026-1032, May/Jun. 1986.
Fathauer et al, "Heteroepitaxy of Semiconductor on-insulator Structures: Si and Ge on CaF.sub.2 /Si(III)"., J. Appl. Phys. 60(11) pp. 3886-3892, Dec. 1, 1986.
Anderson Terry J.
Hoch Jr. Karl J.
Kunemund Robert
Northrop Grumman Corporation
LandOfFree
Process for fabricating structurally robust optical coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for fabricating structurally robust optical coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for fabricating structurally robust optical coatings will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-19544