Process for fabricating optical wave-guiding components and comp

Details Process for fabricating optical wave-guiding components and comp Process for fabricating optical wave-guiding components and comp

1983-07-19

1986-04-29

Powell, William A.

Metal treatment

Stock

Ferrous

29572, 29576B, 148 15, 148187, 156653, 156657, 1566591, 357 30, 357 91, 427 93, G02B 610, H01L 2122, H01L 3100, B44C 122

Patent

active

045852995

ABSTRACT:
Optical wave-guiding components and a process for fabricating such components in a substrate using conventional integrated circuit fabrication techniques. Ions of a suitable dopant are selectively implanted in a silicon substrate to create an interior region defining a wave-guiding region of a first index of refraction. A wave confining region surrounding the wave-guiding region is created by oxidizing the silicon substrate. The wave confining region has a index of refraction lower than that of the interior wave-guiding region defined by the implanted dopant. Various configurations of components, from which various optical component characteristics can be obtained, are disclosed. The optical components also may be combined with electronic circuit components formed on the same silicon substrate.

REFERENCES:
patent: 4087315 (1978-05-01), Auracher et al.
patent: 4435897 (1984-03-01), Kuroda et al.

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