Process for fabricating multisegment ridge waveguides

Details Process for fabricating multisegment ridge waveguides Process for fabricating multisegment ridge waveguides

1996-01-25

1998-08-04

Breneman, R. Bruce

Etching a substrate: processes

Forming or treating optical article

437129, 385130, 216 40, G02B 612

Patent

active

057888566

ABSTRACT:
A process for fabricating multisegment ridge waveguides is disclosed which is self-aligning and avoids unnecessary masking and etching steps. The process essentially comprises five steps: removing, in a starting layer structure, a top layer (DS) on both sides of areas where segment transitions (ST) are to be formed; depositing a metal contact layer (KM); etching a desired ridge-waveguide structure (R); covering the entire area except the segment transition areas with photoresist; and removing the contact layer (KM) in the segment transition areas by a lift-off step, thus providing electrical separation between the individual segments.

REFERENCES:
patent: 4359260 (1982-11-01), Reinhart et al.
patent: 4805184 (1989-02-01), Fiddyment et al.
patent: 4895615 (1990-01-01), Muschke
patent: 5105433 (1992-04-01), Eisele et al.
patent: 5125065 (1992-06-01), Stoll et al.
patent: 5579424 (1996-11-01), Schneider

Affiliated with

Also associated with

Rating

Process for fabricating multisegment ridge waveguides does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for fabricating multisegment ridge waveguides, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for fabricating multisegment ridge waveguides will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1173552