Process for fabricating inexpensive high performance solar cells

Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148187, 136 89CC, 357 30, H01L 21225

Patent

active

041013514

ABSTRACT:
Silicon solar cells may be made from either "P" type substrates with "N" type dopants to form the geometries or with "N" type substrates and "P" type dopants forming the junction. This invention relates to the dopant species employed, the improved method of application and junction formation, formation of insitu anti-reflective coatings, and improved metallization processing for silicon solar cells. The invention does not affect preparation of the silicon substrate prior to diffusion steps, and is applicable both to planar solar cells and to vertical-multijunction cells. This invention discloses an alternate process of junction formation using arsenic as dopant. The process is uniquely different in the fact that it simplifies the number of process steps by using the doped oxide for junction formation, metallization mask and as an anti-reflection surface layer.

REFERENCES:
patent: RE28610 (1975-11-01), Lindmayer
patent: 3359137 (1967-12-01), Kaye et al.
patent: 3361594 (1968-01-01), Iles et al.
patent: 3755015 (1973-08-01), Redington et al.
patent: 3915766 (1975-10-01), Pollack

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for fabricating inexpensive high performance solar cells does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for fabricating inexpensive high performance solar cells, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for fabricating inexpensive high performance solar cells will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-337254

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.