Fishing – trapping – and vermin destroying
Patent
1991-03-25
1992-12-29
Hearn, Brian E.
Fishing, trapping, and vermin destroying
437225, 437229, 156638, 1566591, H01L 2144
Patent
active
051751240
ABSTRACT:
A process for fabricating a semiconductor device uses re-ionized water, such as carbonated water, to rinse the device while preventing microcorrosion of metal layers. In one embodiment of the invention, a semiconductor wafer is provided having an overlying metal layer and a patterned layer overlying the overlying metal layer. Selected portions of the overlying metal layer are etched using the patterned layer as an etch mask. The patterned layer is removed by immersing the device in an organic solution without affecting the remaining metal layer. The device is then rinsed in a reservoir of re-ionized water to remove the organic solution from the device while preventing microcorrosion of the remaining metal layer.
REFERENCES:
patent: 4997746 (1991-03-01), Greco et al.
patent: 5025597 (1991-06-01), Tada et al.
Translation of JP 61-268391 (Sakamoto et al.).
"Microcorrosion of Al-Cu and Al-Cu-Si Alloys: Interaction of the Metallization with Subsequent Photolithographic Processing", by D. Weston et al., J. Vac. Sci. Tech., vol. 8, No. 3, May/Jun. 1990.
"Immersion Develop Rinse Water Injection Process to Eliminate Positive Photoresist Scumming", by Paul M. Winebarger, Motorola Technical Developments, vol. 8, pp. 9-10, Oct. 1988.
Goddard Patricia S.
Hearn Brian E.
Holtzman Laura M.
Motorola Inc.
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