Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-01-04
2005-01-04
Mohamedulla, Saleha R. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
06838213
ABSTRACT:
A process for fabricating a mask, including depositing a membrane layer on a substrate, etching a backside of the substrate to form membrane windows, depositing at least one scattering layer on the membrane layer depositing a mask layer on the at least one scattering layer exposing the mask layer corresponding to membrane windows to reveal pattern areas, transferring the pattern areas in the mask layer to the at least one scattering layer, transferring at least one of the pattern areas in the at least scattering layer to the membrane layer to produce a hybrid stencil/continuous membrane mask. Alternatively, all of the pattern areas in the at least one scattering layer are transferred to the membrane layer to produce a stencil mask.
REFERENCES:
patent: 5260151 (1993-11-01), Berger et al.
patent: 5567551 (1996-10-01), Yahalom et al.
patent: 5798194 (1998-08-01), Nakasuji et al.
patent: 5968336 (1999-10-01), Rolfson
patent: 6051346 (2000-04-01), Kornblit et al.
patent: 6110331 (2000-08-01), Rolfson
patent: 6124063 (2000-09-01), Dauksher et al.
patent: 6316151 (2001-11-01), Kim et al.
patent: 4-240719 (1992-08-01), None
J. A. Liddle, et al., “Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique”, J. Vac. Sci. Technol. B9 (6), Nov./Dec. 1991, pp. .3000-3004.
Kasica Richard J.
Novembre Anthony
Agere Systems Inc.
Mohamedulla Saleha R.
LandOfFree
Process for fabricating a mask does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for fabricating a mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for fabricating a mask will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3424996