Process for fabricating a device in which the process is control

Details Process for fabricating a device in which the process is control Process for fabricating a device in which the process is control

1995-02-21

1997-08-12

Powell, William

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

430 30, 216 12, 216 85, 216 41, B44C 122

Patent

active

056561822

ABSTRACT:
The present invention is directed to a process for device fabrication in which a spatially resolved latent image of latent features in an energy sensitive resist material is used to control process parameters. In the present process, an energy sensitive resist material is exposed to radiation using a patternwise or blanket exposure. An image of the latent effects of the exposure is obtained using a near-field imaging technique. This image of the latent effects of the exposure is used to control parameters of the lithographic process such as focus, lamp intensity, exposure dose, exposure time, and post exposure baking by comparing the image so obtained with the desired effects of the exposure and adjusting the relevant lithographic parameter to obtain the desired correlation between the image obtained and the desired effect. The image of the latent effects of exposure are also used to characterize the mask used in the lithographic process or to characterize the lithographic stepper used in the lithographic process.

REFERENCES:
patent: 5254854 (1993-10-01), Betzig
patent: 5288572 (1994-02-01), Konstantinos et al.
patent: 5288998 (1994-02-01), Betzig et al.
patent: 5288999 (1994-02-01), Betzig et al.
patent: 5498579 (1996-03-01), Borodoovaky et al.
Guerra, J. M., "Photon Tunneling Microscopy", Applied Optics, vol. 29, No. 26, pp. 3741-3752, (Sep. 10, 1990).
Adams, T. E., "Applications of Latent Image Metrology in Microlithography", SPIE, vol. 1464, Integrated Circuit Metrology, Inspection, and Process Colntrol V, pp. 294-303, (1991).

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