Process for extracting arsenic from oxidic materials

Details Process for extracting arsenic from oxidic materials Process for extracting arsenic from oxidic materials

1978-06-29

1980-08-19

Langel, Wayne A.

Chemistry of inorganic compounds

Treating mixture to obtain metal containing compound

Group va metal or arsenic

C01B 2702

Patent

active

042184258

ABSTRACT:
A process is disclosed for the selective extraction of arsenic from oxidic materials containing compounds such as arsenic trioxide, arsenic pentoxide, antimony trioxide, antimony pentoxide, antimony tetroxide and mixtures thereof in which arsenic is effectively separated from antimony. Said oxidic materials are subjected to a leach with a lixiviant containing arsenic acid or hydrogen peroxide at a temperature in the range of 40.degree. C. to the boiling point of the reaction mixture, preferably in the range of 80.degree. to 100.degree. C., for 5 to 90 minutes. The leach solution containing arsenic oxides is separated from leach residue. The leach solution is either cooled to a temperature in the range of 5.degree. to 25.degree. C. to crystallize and subsequently recover arsenic trioxide or the solution is oxidized and evaporated and arsenic pentoxide is recovered. Arsenic acid lixiviant contains 5 to 500 g/l arsenic as arsenic pentoxide, preferably 25 to 200 g/l, and hydrogen peroxide lixiviant preferably contains a 10 to 60% hydrogen peroxide concentration.

REFERENCES:
patent: 4102976 (1978-07-01), Hiemeleers et al.
Schumb et al., Hydrogen Peroxide, (1955), Reinhold Publishing Corporation, pp. 4-7, 400-402.

Affiliated with

Also associated with

Rating

Process for extracting arsenic from oxidic materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for extracting arsenic from oxidic materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for extracting arsenic from oxidic materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1427603