Process for etching trace side walls

Details Process for etching trace side walls Process for etching trace side walls

1997-04-30

1999-05-18

Utech, Benjamin

Etching a substrate: processes

Nongaseous phase etching of substrate

Projecting etchant against a moving substrate or controlling...

216105, 216106, B44C1/22

Patent

active

059048638

ABSTRACT:
A process for etching the sides of a trace remove the feet which extend laterally out from the sides and over a circuit board substrate adjacent the trace.

REFERENCES:
patent: 4357196 (1982-11-01), Tanaka et al.
patent: 5308447 (1994-05-01), Lewis et al.
patent: 5591299 (1997-01-01), Seaton et al.
patent: 5665200 (1997-09-01), Fujimoto et al.
"Optimization of The Ferric Chloride Etching of Shadow Masks"; Moscony et al.; J. of the Society For Info. Display; vol. 4; No. 4; pp. 231-239, Dec. 1996.

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