Process for enhancing the resistance of a resist image to reacti

Details Process for enhancing the resistance of a resist image to reacti Process for enhancing the resistance of a resist image to reacti

1986-08-25

1987-09-01

Kittle, John E.

Coating processes

With post-treatment of coating or coating material

Chemical agent applied to treat coating

4273831, 4274198, 4272481, 156628, 430324, 430325, 430326, 430331, G03C 500, B05D 304

Patent

active

046908382

ABSTRACT:
The reactive ion etching and thermal flow resistance of a resist image is enhanced by contacting the resist image with an alkyl metal compound of magnesium or aluminum.

REFERENCES:
patent: 4201800 (1980-05-01), Alcorn et al.
patent: 4239781 (1980-10-01), Piascinski et al.
patent: 4259369 (1981-03-01), Canavello et al.
patent: 4259421 (1981-03-01), Goldman
patent: 4307178 (1981-12-01), Kaplan et al.
patent: 4439516 (1984-03-01), Cernigliaro et al.
Radiation Chem. Photochem., vol. 96, 1982, Abstract 152832t.
Radiation Chem. Photochem., vol. 97, 1982, Abstract 153930f.

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