Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate
2005-07-19
2009-10-06
Ghyka, Alexander G (Department: 2812)
Semiconductor device manufacturing: process
Chemical etching
Liquid phase etching
C438S753000, C257SE21219, C134S001300
Reexamination Certificate
active
07598181
ABSTRACT:
Processes for enhancing solubility and the reaction rates in supercritical fluids are provided. In preferred embodiments, such processes provide for the uniform and precise deposition of metal-containing films on semiconductor substrates as well as the uniform and precise removal of materials from such substrates. In one embodiment, the process includes, providing a supercritical fluid containing at least one reactant, the supercritical fluid being maintained at above its critical point, exposing at least a portion of the surface of the semiconductor substrate to the supercritical fluid, applying acoustic energy, and reacting the at least one reactant to cause a change in at least a portion of the surface of the semiconductor substrate.
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Kramer Stephen J.
Taylor Theodore M.
Dinsmore & Shohl LLP
Ghyka Alexander G
Micro)n Technology, Inc.
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