Cleaning and liquid contact with solids – Processes – Using sequentially applied treating agents
Patent
1997-03-17
1999-01-19
Loring, Susan A.
Cleaning and liquid contact with solids
Processes
Using sequentially applied treating agents
134 3, 134 33, 134 36, 134 2215, 216 2, B08B 300, B08B 700, C23G 102, C23F 100
Patent
active
058610642
ABSTRACT:
A novel method is disclosed for the removal of organic material, particularly hardened photoresist, from the surface of a substrate. Layers of organic material are removed using at least two treatment cycles, each of which includes the steps of a) applying an acid-containing composition, optionally mixed with an oxidizer, to the substrate surface, and then b) applying water to the substrate surface. The process is characterized by higher temperature spikes, shorter process times and lower chemical usage than is obtained with conventional photoresist stripping methods which do not employ repetitious treatments. The method may be practiced with spray processing equipment.
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Oikari James R.
Olson Erik D.
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