Chemistry: electrical and wave energy – Processes and products
Patent
1989-05-24
1991-06-18
Kaplan, G. L.
Chemistry: electrical and wave energy
Processes and products
204 521, 546139, 546152, 546339, 562108, 562110, C25D 312, C25D 338, C07D21300
Patent
active
050247360
ABSTRACT:
A process in which disubstituted ethane sulfonic compounds are employed as electroplating auxiliaries in electroplating. The compounds for use in combination with the claimed process have the general formula: ##STR1## wherein, A represents a pyridinium radical ##STR2## in which R.sub.1 and R.sub.2 denote hydrogen or an alkyl radical having 1 to 3 carbon atoms, or R.sub.1 and R.sub.2, together with the pyridinium radical, form a condensed six-membered aromatic ring; or,
REFERENCES:
patent: 2876177 (1959-03-01), Gundel et al.
patent: 3314868 (1967-04-01), Willmund et al.
patent: 3328273 (1967-06-01), Creutz et al.
patent: 3376308 (1968-04-01), Gundel
Chemical Abstracts, vol. 102, 4534v, 1985, "Canadian Journal of Chemistry".
Clauss Wolfgang
Kurze Werner
Leifeld Ferdinand
Wassenberg Willy
Kaplan G. L.
Raschig AG
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