Coating processes – Immersion or partial immersion – Chemical compound reducing agent utilized
Patent
1988-05-06
1990-06-19
Beck, Shrive
Coating processes
Immersion or partial immersion
Chemical compound reducing agent utilized
427305, 427 98, B05D 118
Patent
active
049352679
ABSTRACT:
By forming a first copper layer on a substrate by using a complexing agent for copper ion, which has a low copper complex stability constant, a uniform second layer can be stably formed by a second complexing agent for a copper ion, which has a high copper complex stability constant, even if the substrate is composed of a material having a low catalytic activity, such as tungsten, or even if the catalytic activity of the substrate is uneven. A similar effect can also be obtained by adding a small amount of a complexing agent for a copper ion, having a low stability constant, to an electroless copper plating bath containing a complexing agent for a copper ion, having a low stability constant. In this case, an effect of preventing stopping of the reaction of the complexing agent of a copper ion, having a high stability constant, is attained. Most preferably, after formation of a uniform first copper layer by an electroless copper plating solution containing a complexing agent for a copper ion, having a low stability constant, a second copper layer is formed by an electroless copper plating solution containing a complexing agent for a copper ion, having a high stability constant and also in this case, a small amount of a complexing agent for a copper ion, having a low stability constant, is added.
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Ishida Nobumasa
Ishikawa Futoshi
Ishikawa Junji
Kondo Koji
Murakawa Katuhiko
Beck Shrive
Dang Vi Duong
Nippondenso Co. Ltd.
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